Comparison study for sub-0.13-um lithography between ArF and KrF lithography

Seok-Kyun Kim; YoungSik Kim; Jin-Soo Kim; Cheol-Kyu Bok; Young-Mog Ham; Ki-Ho Baik

doi:10.1117/12.389031

5 July 2000 Comparison study for sub-0.13-μm lithography between ArF and KrF lithography

Seok-Kyun Kim, YoungSik Kim, Jin-Soo Kim, Cheol-Kyu Bok, Young-Mog Ham, Ki-Ho Baik

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389031
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

In this paper we investigated the feasibility of printing sub-0.13 micrometers device patterns with ArF and KrF lithography by using experiment and simulation. To do this we evaluated various cell structures with different sizes from 0.26 micrometers to 0.20 micrometers pitch. In experiment 0.60NA ArF and 0.70NA KrF exposure tools, commercial and in house resists and bottom anti-reflective coating (BARC) materials are used. To predict and compare with experimental data we also used our developed simulation tool HOST base don diffused aerial iamge model. We found that ArF lithography performance is a little bit better than KrF and therefore 0.70NA KrF lithography can be used up to 0.12 micrometers design rule device and 0.60NA ArF lithography can be used up to 0.11 micrometers . But to get more than 10 percent expose latitude, 0.13 micrometers with KrF and 0.12 micrometers with ArF are the minimum design rule size. However to obtain process margin we had to use extreme off-axis illumination (OAI) which results in large isolated- dense bias and poor linearity including isolated pattern. Using higher NA can reduce ID bias and mask error factor. For contact hole it is more effective to use KrF lithography because resist thermal flow process can be used to shrink C/H size. Our developed ArF resist and BARC shows good performance and we can reduce k1 value up to 0.34. Through this study we verified again that ArF lithography can be applied for sub-0.13 micrometers device through sub-0.10 micrometers with high contrast resist and 0.75NA exposure tool.

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Seok-Kyun Kim, YoungSik Kim, Jin-Soo Kim, Cheol-Kyu Bok, Young-Mog Ham, and Ki-Ho Baik "Comparison study for sub-0.13-μm lithography between ArF and KrF lithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389031

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KEYWORDS

Lithography

Electroluminescence

Photoresist processing

Critical dimension metrology

Etching

Photomasks

Printing

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