Paper
29 November 2000 New type of low-loss SiO2 Y-branch waveguide
Baoxue Chen, Yifang Yuan, Mamoru Iso
Author Affiliations +
Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408325
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
A novel Y-branch waveguide structure, in which a transitional guide is embedded between an incident channel and output branches, is presented. The transitional guide is used to improve the mode field matching between both waves supported by the incident and output waveguides. Numerical simulations show that this geometry can minimize the junction loss to 0.041 dB at 1310 nm and 0.052 dB at 1550 nm wavelength, respectively. Silica samples based on the design are fabricated by PECVD. Determination shows that the samples exhibit very low junction loss of about 0.08 dB and 0.09 dB at the two wavelengths.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Baoxue Chen, Yifang Yuan, and Mamoru Iso "New type of low-loss SiO2 Y-branch waveguide", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408325
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KEYWORDS
Waveguides

Silica

Plasma enhanced chemical vapor deposition

Light wave propagation

Radiation effects

Beam propagation method

Interfaces

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