Challenge of the F2 laser for dioptric projection system

Tatsuya Ariga; Hidenori Watanabe; Takahito Kumazaki; Naoki Kitatochi; Kotaro Sasano; Yoshifumi Ueno; Toshihiro Nishisaka; Ryoichi Nohdomi; Kazuaki Hotta; Hakaru Mizoguchi; Kiyoharu Nakao

doi:10.1117/12.435650

14 September 2001 Challenge of the F₂ laser for dioptric projection system

Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Author Affiliations +

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435650
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

It is predicted that the semiconductor market will demand 70 nm devices from 2004 or 2005. Hence, F2 laser microlithography systems have to be developed according to this time frame. At ASET, 'The F2 Laser Lithography Development Project' started in March 2000, as a 2-year project to fulfill this market requirement. The final target of this project is to achieve a F2 laser spectral bandwidth of 0.2 pm (FWHM) at a repetition rate of 5000 Hz and an average power of 25 W. These specifications meet the demand of dioptric projection system. We have done a feasibility study for a high efficiency line narrowing design to achieve the ultra narrow spectral bandwidth and the high output power. In addition, we have developed an intermediate engineering laser system consisting of an oscillator laser and an amplifier. With this laser system we have performed the line-narrowed operation using two arrangements: Master Oscillator Power Amplifier (MOPA) and Injection Locking. With this Oscillator-Amplifier system and have achieved a spectral bandwidth (convoluted) of FWHM <0.2 pm with both systems: MOPA and Injection Locking. The maximum output energy was >20 mJ for MOPA and >15 mJ for Injection Locked operation.

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Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, and Kiyoharu Nakao "Challenge of the F₂ laser for dioptric projection system", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435650

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