Final inspection of photomask blanks

Fredi Schubert; Hartmut Sauerbrei; Lutz Aschke; Konrad Knapp

doi:10.1117/12.425223

26 April 2001 Final inspection of photomask blanks

Fredi Schubert, Hartmut Sauerbrei, Lutz Aschke, Konrad Knapp

Proceedings Volume 4404, Lithography for Semiconductor Manufacturing II; (2001) https://doi.org/10.1117/12.425223
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom

Abstract

In order to increase the quality in manufacturing of future photon mask generations Schott Lithotec is brought in a brand new, much increased automatic laser inspection system into a new manufacturing line of photo mask blanks. It is in a position to detect additionally to the standard defect types further defect types like dim- and bright-chrome defects. The resolution of the system is less than 100 nm. With a quickly inspecting time per blank of less than three minutes and for the first time in the world used automatic SMIF-pod-handling this is a tool for the 100 percent final inspection in the manufacturing of photo mask blanks.

Citation Download Citation

Fredi Schubert, Hartmut Sauerbrei, Lutz Aschke, and Konrad Knapp "Final inspection of photomask blanks", Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); https://doi.org/10.1117/12.425223

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