Half-tone PSM inspection sensitivity of 257-nm light source MC-3000

Hideo Tsuchiya; Kyoji Yamashita; Shinji Sugihara; Takeshi Fujiwara; Ryoji Yoshikawa

doi:10.1117/12.458360

11 March 2002 Half-tone PSM inspection sensitivity of 257-nm light source MC-3000

Hideo Tsuchiya, Kyoji Yamashita, Shinji Sugihara, Takeshi Fujiwara, Ryoji Yoshikawa

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458360
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Binary (Chromium) and, KrF/ArF phase shift masks (PSM) were inspected by MC-3000, which uses DUV (257nm) light source, and an evaluated results of these sensitivities are shown. In the case of the chromium mask, sufficient detection sensitivity for 130nm-device inspection was obtained. For KrF and ArF phase shift masks, the detection sensitivities of the edge and the corner areas are practically equivalent to that of chromium. Though the detection sensitivity of a minute pinhole is slightly lower under the influence of the diffracted light. With an ArF phase shift mask, the contrast of absorber and a glass portion is low, and so improvement of the signal noise ratio of a sensor becomes essential for false-defect control. Additionally, the minute pinhole detection sensitivity will be higher, if a reflective inspection etc. is carried out.

Citation Download Citation

Hideo Tsuchiya, Kyoji Yamashita, Shinji Sugihara, Takeshi Fujiwara, and Ryoji Yoshikawa "Half-tone PSM inspection sensitivity of 257-nm light source MC-3000", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458360

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