Coupling Of Pulsed 0.35 Micron Laser Radiation To Metal Surfaces In Vacuum

D. Rosen; G. Weyl; D. Hastings; J. Mittledorf

doi:10.1117/12.942581

15 August 1984 Coupling Of Pulsed 0.35 Micron Laser Radiation To Metal Surfaces In Vacuum

D. Rosen, G. Weyl, D. Hastings, J. Mittledorf

Proceedings Volume 0476, Excimer Lasers: Their Applications & New Frontiers in Lasers; (1984) https://doi.org/10.1117/12.942581
Event: 1984 Technical Symposium East, 1984, Arlington, United States

Abstract

The results of experiments and theoretical analyses are presented for the response of aluminum and titanium alloy surfaces irradiated in vacuum by an XeF laser pulse (X=0.35μm, pulse time = 10-6s). Thermal coupling measurements at low irradiance indicate effective optical absorptance values of -0.4 for as-received aluminum alloys, -0.2 for polished or "laser-cleaned" aluminum alloys, and 0.4-0.5 for Ti6AX4V (as-received or polished). The onset of measurable impulse is shown to result from bulk target vaporization at fluences >5 J/cm2 for titanium and >20 J/cm2 for 'polished' aluminum alloys. Plasma formation thresholds are obtained both theoretically and from experimental data, and good agreement is found. The results indicate that an important absorption mechanism for laser-induced plasma ignition at this wavelength is photoionization of excited electronic states in the metal vapor.

Citation Download Citation

D. Rosen, G. Weyl, D. Hastings, and J. Mittledorf "Coupling Of Pulsed 0.35 Micron Laser Radiation To Metal Surfaces In Vacuum", Proc. SPIE 0476, Excimer Lasers: Their Applications & New Frontiers in Lasers, (15 August 1984); https://doi.org/10.1117/12.942581

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