Benchmarking of current generation overlay systems at the 130-nm technology node

Beth Russo; Michael Bishop

doi:10.1117/12.482674

2 June 2003 Benchmarking of current generation overlay systems at the 130-nm technology node

Beth Russo, Michael Bishop

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.482674
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The Overlay Metrology Advisory Group (OMAG) is a group comprised of technical experts in the field of optical metrology from International SEMATECH Member Companies and the National Institute of Standards and Technology (NIST). This council created a specification for overlay metrology benchmarking which indicates the critical parameters to be addressed in order to comply with the International Technology Roadmap for Semiconductors (ITRS) for the 130-nm technology node. A benchmarking study was completed that compares several of the currently available overlay metrology tools. This paper contains the methodologies for benchmarking overlay metrology tools, a comparison of repeatability, reproducibility, throughput, tool-induced shift (TIS) variability, accuracy, and TIS through focus measurements between the participating tools. The tools were identified to the International SEMATECH Member Companies and the appropriate tool suppliers. The identity of the tools will remain only with these select groups. This paper intends to serve as a reference to the current tools' ability to meet the ITRS Roadmap specifications for the 130-nm technology node.

Citation Download Citation

Beth Russo and Michael Bishop "Benchmarking of current generation overlay systems at the 130-nm technology node", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.482674

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