High-performance beam stabilization for next-generation ArF beam delivery systems

Leonard Lublin; David Warkentin; Palash P. Das; Alexander I. Ershov; Jody Vipperman; Ronald L. Spangler; Brian Klene

doi:10.1117/12.485351

26 June 2003 High-performance beam stabilization for next-generation ArF scanner systems

Leonard Lublin, David Warkentin, Palash P. Das, Alexander I. Ershov, Jody Vipperman, Ronald L. Spangler, Brian Klene

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485351
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

With the advent of 193 nm systems processing 300 mm wafers, the production lithography cell is about to undergo a technology shift. The mechanism for delivering the beam from the light source to the illumination system, here referred to as a Beam Delivery Unit (BDU), must change to meet the challenges imposed by this shift. To support these changes, Cymer is developing a BDU that will guarantee a stable beam at the scanner entrance during exposure. The beam stabilization control system has been implemented in a test BDU. We shall present results from experiments that demonstrate our ability to significantly improve short and long term “Beam Stability”.

Citation Download Citation

Leonard Lublin, David Warkentin, Palash P. Das, Alexander I. Ershov, Jody Vipperman, Ronald L. Spangler, and Brian Klene "High-performance beam stabilization for next-generation ArF scanner systems", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485351

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