Paper
12 May 2003 Effects of body biasing on the low-frequency noise of NMOSFETs from a 130-nm CMOS technology
Mathieu Marin, M. Jamal Deen, Mario de Murcia, Pierre Llinares, Jean Charles Vildeuil
Author Affiliations +
Proceedings Volume 5113, Noise in Devices and Circuits; (2003) https://doi.org/10.1117/12.488964
Event: SPIE's First International Symposium on Fluctuations and Noise, 2003, Santa Fe, New Mexico, United States
Abstract
We investigate the impact of body biasing on the low frequency noise (LFN) performances of NMOS transistors from a transistors 130 nm CMOS technology. The body-to-source voltage VBS was varied from - 0.5 to + 0.5 V for reverse and forward mode substrate biasing. A detailed electrical characterization was performed and the benefits of the body bias analysed in terms of current and maximum transconductance variations. Noise measurements were first performed at low drain bias VDS = 25 mV and VBS = 0 V in order to discuss the noise model. Results are in agreement with the carrier number fluctuation theory. Bulk bias dependence of the LFN was investigated at VDS = VDD = 1.2 V. Significant noise reduction is observed in the subthreshold regime when applying a forward body bias. In strong inversion, the noise level is found to be approximately independent of the substrate bias VBS.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mathieu Marin, M. Jamal Deen, Mario de Murcia, Pierre Llinares, and Jean Charles Vildeuil "Effects of body biasing on the low-frequency noise of NMOSFETs from a 130-nm CMOS technology", Proc. SPIE 5113, Noise in Devices and Circuits, (12 May 2003); https://doi.org/10.1117/12.488964
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Cited by 2 scholarly publications.
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KEYWORDS
Transistors

CMOS technology

Capacitance

Oxides

Amplifiers

Denoising

Field effect transistors

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