Gray-scale fabrication of micro-optics in bulk zinc selenide and bulk multispectral zinc sulfide

Gregg T. Borek; Daniel M. Brown; Jared A. Shafer

doi:10.1117/12.524580

29 December 2003 Gray-scale fabrication of micro-optics in bulk zinc selenide and bulk multispectral zinc sulfide

Gregg T. Borek, Daniel M. Brown, Jared A. Shafer

Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.524580
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

Manufacturing processes have been developed to produce high performance wafer form microoptics in both bulk zinc selenide and bulk multispectral zinc sulfide. Gray scale photolithography techniques have been used to pattern aspheric refractive lenses and beam shaping diffractive structures in wafer form for both of the zinc based II-VI group materials. High density plasma etching recipes have been refined to etch gray scale photoresist patterns into the bulk II-VI wafer materials with controllable selectivity. These IR materials have the advantage over other IR materials of transmitting broadband radiation, including visible band radiation. This very wide transmission band capability (visible to LWIR) permits dual band applications to use the same optical path. The high index of refraction of these materials permits production of higher numerical aperture lenses that have reduced lens sag requirements.

Citation Download Citation

Gregg T. Borek, Daniel M. Brown, and Jared A. Shafer "Gray-scale fabrication of micro-optics in bulk zinc selenide and bulk multispectral zinc sulfide", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.524580

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