Fabrication of high-resolution gratings for polymeric optical waveguide devices

Shinya Shibata; Okihiro Sugihara; Toshikuni Kaino; Naomichi Okamoto

doi:10.1117/12.538777

18 June 2004 Fabrication of high-resolution gratings for polymeric optical waveguide devices

Shinya Shibata, Okihiro Sugihara, Toshikuni Kaino, Naomichi Okamoto

Proceedings Volume 5351, Organic Photonic Materials and Devices VI; (2004) https://doi.org/10.1117/12.538777
Event: Integrated Optoelectronic Devices 2004, 2004, San Jose, CA, United States

Abstract

High resolution gratings for the application of optical waveguide devices are fabricated using a series of photopolymers. The relief gratings were formed by the two-beam interference ablation technique using a third-harmonic generation of a Nd:YAG laser (355nm) onto polyimide and electrooptic polymer films. In polyimide films, the gratings with a period of 400nm and a depth of about 280nm were fabricated by the single-pulse irradiation. We tried to fabricate the gratings using a photoresist accompanied with wet development using an Ar⁺laser (488nm). By wet development process, higher aspect and clearer periodical structure at a depth of 320nm and a period of nearly 500nm was realized. High diffraction efficiency of 55.4% was measured from the relief grating. We also replicated the grating to UV curable epoxy resin as an embossing master for the fabrication of waveguide devices.

Citation Download Citation

Shinya Shibata, Okihiro Sugihara, Toshikuni Kaino, and Naomichi Okamoto "Fabrication of high-resolution gratings for polymeric optical waveguide devices", Proc. SPIE 5351, Organic Photonic Materials and Devices VI, (18 June 2004); https://doi.org/10.1117/12.538777

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