Paper
1 July 2004 Trends in porous silicon biomedical devices: tuning microstructure and performance trade-offs in optical biosensors
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Abstract
High surface area mesoporous silicon microcavities are investigated for direct detect optical biosensor applications. Device quality is reported as a function of fabrication parameters. A dilute KOH etch process is utilized to modify the intrinsic 3D microstructure to enable enhanced pore infiltration of large biomolecules. Results suggest that the KOH etch mechanism is a two step process consisting of a fast step where high surface area nanostructures are rapidly removed. This is followed by a slower step where silicon is removed from the pore channel walls. The enzyme, Glutathione-S-Transferase (50kDa), is utilized to probe pore infiltration. Results from a solid phase immobilized enzyme assay support our conclusions on the impact the KOH etch step has on modifying the porous silicon microstructure. Preliminary findings point to trade-offs that exists between optimizing microstructure with microcavity operation mode and device sensitivity.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lisa A. DeLouise and Ben L. Miller "Trends in porous silicon biomedical devices: tuning microstructure and performance trade-offs in optical biosensors", Proc. SPIE 5357, Optoelectronic Integration on Silicon, (1 July 2004); https://doi.org/10.1117/12.527578
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Cited by 7 scholarly publications.
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KEYWORDS
Optical microcavities

Silicon

Mirrors

Reflection

Etching

Sensors

Oxidation

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