Paper
14 May 2004 Characterization of new ultrathick chemically amplified positive-tone photoresists suitable for electroplating application
Anja Voigt, Marina Heinrich, Gabi Gruetzner
Author Affiliations +
Abstract
There is an increasing need for highly viscous and easy to process thick and ultra thick photoresists for the production of Micro-Electro-Mechanical-Systems (MEMS) and advanced packaging. Here we present results with some novel positive tone photoresists formulated for this purpose. For that we transfered the concept of chemically amplified resists (CARs), originally designed to meet the IC-industry demands for miniaturization and higher resolution, to highly viscous resists. Various polymeric materials have been tested regarding their use in thick CARs. Appropriate resist formulations were developed and their lithographic performance was investigated in a thickness range of 50-150 microns. The CARs are sensitive to UV400.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anja Voigt, Marina Heinrich, and Gabi Gruetzner "Characterization of new ultrathick chemically amplified positive-tone photoresists suitable for electroplating application", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.535205
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Photoresist materials

Electroplating

Lithography

Microelectromechanical systems

Packaging

Copper

Polymers

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