The rising cost and complexity of RETs

Mark E. Mason

doi:10.1117/12.546794

3 May 2004 The rising cost and complexity of RETs

Mark E. Mason

Proceedings Volume 5379, Design and Process Integration for Microelectronic Manufacturing II; (2004) https://doi.org/10.1117/12.546794
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

For the last several years, Resolution Enhancement Technologies (RETs) have helped make it possible for lithographers to stay on the path set for them by Goordon Moore. Though seldom discussed in detail, these RETs have a real cost in terms of data file size, computation times, complexity of metrology and inspection, licenses fees, manpower and delay. The International Sematech Cost of Ownership (CoO) analysis can be used to estimate the impact of RETs on overall Lithography CoO and on the cost per modern semiconductor wafer, which appears to be around $10/ RET level for a high-volume ASIC case.

Citation Download Citation

Mark E. Mason "The rising cost and complexity of RETs", Proc. SPIE 5379, Design and Process Integration for Microelectronic Manufacturing II, (3 May 2004); https://doi.org/10.1117/12.546794

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