Paper
17 August 2004 Makyoh topography: a simple yet powerful optical method for flatness and defect characterization of mirror-like surfaces
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Abstract
Makyoh topography is an optical surface defect and flatness characterization tool. Its operation principle is based on the whole-field reflection of a collimated beam and defocused detection. This paper reviews the history, the basic principles and applications of the method. The problem of quantitativity is discussed in detail and the solutions are described. The accuracy limits are discussed. Application examples are shown from semiconductor wafer processing and MEMS technology. Comparison is made to related optical and other topographic techniques.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ferenc Riesz "Makyoh topography: a simple yet powerful optical method for flatness and defect characterization of mirror-like surfaces", Proc. SPIE 5458, Optical Micro- and Nanometrology in Manufacturing Technology, (17 August 2004); https://doi.org/10.1117/12.546018
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Cited by 20 scholarly publications.
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KEYWORDS
Semiconducting wafers

Silicon

Microelectromechanical systems

Diffraction

Mirrors

Wafer-level optics

Cameras

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