Detailed simulation of two-photon absorption for 3D micro-nano engineering and patterning

Mary J. Potasek; Yongwang Gao

doi:10.1117/12.570889

19 January 2005 Detailed simulation of two-photon absorption for 3D micro-nano engineering and patterning

Mary J. Potasek, Yongwang Gao

Proceedings Volume 5592, Nanofabrication: Technologies, Devices, and Applications; (2005) https://doi.org/10.1117/12.570889
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States

Abstract

Multiphoton processes are playing a significant role in microfabrication, patterning of nanostructures, formation of photonic band gap materials and ordered micro/nanoarrays. However, many of the chromophores with large two-photon absorption used for these applications are actually hybrid materials in which the two-photon absorption is coupled to an excited state absorption. This coupling makes the detailed analysis of the photophysics significantly more complex. We have developed a numerical technique to investigate hybrid multiphoton processes. Our numerical method compares very well with published results.

Citation Download Citation

Mary J. Potasek and Yongwang Gao "Detailed simulation of two-photon absorption for 3D micro-nano engineering and patterning", Proc. SPIE 5592, Nanofabrication: Technologies, Devices, and Applications, (19 January 2005); https://doi.org/10.1117/12.570889

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