A new method for measuring a small displacement by using the critical angle method and confocal technology

Shu-Jen Liao; Shinn-Fwu Wang; Ming-Hung Chiu

doi:10.1117/12.572739

9 February 2005 A new method for measuring a small displacement by using the critical angle method and confocal technology

Shu-Jen Liao, Shinn-Fwu Wang, Ming-Hung Chiu

Author Affiliations +

Proceedings Volume 5635, Nanophotonics, Nanostructure, and Nanometrology; (2005) https://doi.org/10.1117/12.572739
Event: Photonics Asia, 2004, Beijing, China

Abstract

A new method for measuring a very small displacement is presented. The principles of the measurement are based on the critical angle method and confocal technology. It will increase the lateral and longitudinal resolutions higher than 0.3μm and 5nm, respectively, and the maximum displacement could be above 12μm. This optical structure could be applied to measure some messages for optical surface, bio-medical science, and nanotechnology in the future. The new technique has some merits, such as a simple and compact optical setup, high sensitivity, and high resolution.

Citation Download Citation

Shu-Jen Liao, Shinn-Fwu Wang, and Ming-Hung Chiu "A new method for measuring a small displacement by using the critical angle method and confocal technology", Proc. SPIE 5635, Nanophotonics, Nanostructure, and Nanometrology, (9 February 2005); https://doi.org/10.1117/12.572739

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