Increasing post OPC layout verification coverage using a full-chip simulation based verification method

Chi-Yuan Hung; Yong Dong Wang; Ze Xi Deng; Gen Sheng Gao; Ming Hui Fan

doi:10.1117/12.572711

27 January 2005 Increasing post OPC layout verification coverage using a full-chip simulation based verification method

Chi-Yuan Hung, Yong Dong Wang, Ze Xi Deng, Gen Sheng Gao, Ming Hui Fan

Proceedings Volume 5645, Advanced Microlithography Technologies; (2005) https://doi.org/10.1117/12.572711
Event: Photonics Asia, 2004, Beijing, China

Abstract

As semiconductor manufacturing moves to the 90nm node and below, shrinking feature sizes and increasing IC complexity have combined to significantly stretch out the time needed to optimize and qualify process anchored OPC models and recipes. Process distortion and non-linearity become non-trivial issues and conspire to reduce the quality of the resulting corrections. Additionally, optimizing the OPC model and recipe on a limited set of test chip designs may not provide sufficient coverage across the range of designs to be produced in the process. Finally, the increased complexity of the transformation of the target pattern into a corrected mask pattern also increases the probability of system lithography errors. Fatal errors (pinch or bridge) or poor CD distribution may still occur. As a result, more than one reticle tape-out cycle is non uncommon to prove models and recipes that approach the center of process for a range of designs. In this paper, we describe a full-chip simulation based verification flow using a commercialized product that serves both OPC model and recipe development as well as post OPC verification after production release of the OPC.

Citation Download Citation

Chi-Yuan Hung, Yong Dong Wang, Ze Xi Deng, Gen Sheng Gao, and Ming Hui Fan "Increasing post OPC layout verification coverage using a full-chip simulation based verification method", Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); https://doi.org/10.1117/12.572711

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available