Paper
23 March 2005 Study of point defects created by high-intensity ultrashort pulse laser in YLF crystals
Lilia Coronato Courrol, Everson Braganca dos Santos, Ricardo Elgul Samad, Izilda Marcia Ranieri, Laercio Gomes, Anderson Zanardi de Freitas, Nilson Dias Vieira Jr.
Author Affiliations +
Abstract
In this work we report the creation of color centers in LiF and YLF crystals by high intensity, ultrashort laser pulses. We used pure and Tm3+ and Oxygen doped samples, all irradiated with a Ti:Sapphire CPA laser system and also with electron beam, at room temperature. In both kinds of irradiations the production of photochromic damages and color centers that have absorption bands in UV and visible range was observed. A comparison between the two kinds of irradiation was done and the involved processes are described in this paper. F2+ stable centers were produced by the ultrashort laser pulses irradiation in contrast to the well-known, short lived centers produced by electron beams, and a mechanism was proposed to explain the observed stability.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lilia Coronato Courrol, Everson Braganca dos Santos, Ricardo Elgul Samad, Izilda Marcia Ranieri, Laercio Gomes, Anderson Zanardi de Freitas, and Nilson Dias Vieira Jr. "Study of point defects created by high-intensity ultrashort pulse laser in YLF crystals", Proc. SPIE 5710, Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications IV, (23 March 2005); https://doi.org/10.1117/12.588407
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Color centers

Crystals

Laser induced fluorescence

Ultrafast phenomena

Absorption

Laser crystals

Electron beams

Back to Top