Simulation of fluid flow in the step and flash imprint lithography process

Shravanthi Reddy; Roger T. Bonnecaze

doi:10.1117/12.601413

6 May 2005 Simulation of fluid flow in the step and flash imprint lithography process

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.601413
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Step and Flash Imprint Lithography (SFIL) is a photolithography process in which the photoresist is dispensed onto the wafer in its liquid monomer form and then imprinted and cured into a desired pattern instead of using traditional optic systems. The mask used in the SFIL process is a template of the desired features that is made using electron beam writing. Several variable sized drops of monomer are dispensed onto the wafer for imprinting. The base layer thickness at the end of the imprinting process is typically about 50 nm, with an approximate imprint area of one square inch. This disparate length scale allows simulation of the fluid movement through the template-wafer channel by solving governing fluid equations that are simplified by lubrication theory. Capillary forces are also an important factor governing fluid movement; a dimensionless number known as the capillary number is used to describe these forces. This paper presents a simulation to model the flow and coalescence of the multiple fluid drops and the effect the number of drops dispensed has on final imprint time. The imprint time is shown to decrease with the use of increasing numbers of drops or with the use of an applied force on the template. Appropriate filling of features in the template is an important issue in SFIL, so a mechanism for handling the interface movement into features using a modified boundary condition is outlined and examples are. Fluid spreading outside of the mask edge is also an issue that is resolved by results from this study. The simulation is thus a useful predictive tool providing insight on the effect multiple drop configurations and applied force have on imprint time, as well as providing a means for predicting feature filling.

Citation Download Citation

Shravanthi Reddy and Roger T. Bonnecaze "Simulation of fluid flow in the step and flash imprint lithography process", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.601413

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available