Development of a nanoscale linewidth-standard for high-resolution optical microscopy

Uwe Huebner; W. Morgenroth; R. Boucher; W. Mirandé; E. Buhr; Th. Fries; Nadine Schwarz; G. Kunath-Fandrei; R. Hild

doi:10.1117/12.625194

19 October 2005 Development of a nanoscale linewidth-standard for high-resolution optical microscopy

Uwe Huebner, W. Morgenroth, R. Boucher, W. Mirandé, E. Buhr, Th. Fries, Nadine Schwarz, G. Kunath-Fandrei, R. Hild

Proceedings Volume 5965, Optical Fabrication, Testing, and Metrology II; 59651W (2005) https://doi.org/10.1117/12.625194
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

We are developing a new linewidth standard on the nanometre scale for use in the recently introduced new high-resolution optical microscopy techniques like deep ultraviolet microscopy (UVM) and confocal laser scanning microscopy (CLSM). Different types of high-resolution gratings, etched in amorphous silicon on quartz substrates, have been fabricated and evaluated using state-of-the-art UVM, CLSM, REM and AFM equipment. The produced linewidths range from about 80 nm to 2 μm. The contrast of the pattern in the UV region makes them suitable for transmission and reflection UV and laser scanning microscopy.

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Uwe Huebner, W. Morgenroth, R. Boucher, W. Mirandé, E. Buhr, Th. Fries, Nadine Schwarz, G. Kunath-Fandrei, and R. Hild "Development of a nanoscale linewidth-standard for high-resolution optical microscopy", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651W (19 October 2005); https://doi.org/10.1117/12.625194

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