Paper
9 December 2005 Measurement of optical thickness variation of a multiple-surface object by a wavelength tuning interferometer
Author Affiliations +
Proceedings Volume 6024, ICO20: Optical Devices and Instruments; 60240O (2005) https://doi.org/10.1117/12.666830
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China
Abstract
Wavelength tuning interferometry can distinguish interference signals from different surfaces in frequency space. The optical thickness variation of each layer of a multiple-surface object was measured by a new tunable phase measuring algorithm which can efficiently compensate for the frequency detuning of the interference signals. A two-layer object consisting of Lithium Niobate (LNB) wafer on the supporting glass parallel was measured by the new tunable algorithm in a Fizeau interferometer. Experimental results show that the optical thickness variation of the top wafer was measured with an error of λPV over a 70 mm diameter aperture.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Burke, Kenichi Hibino, Ryohei Hanayama, and Bonzenko F. Oreb "Measurement of optical thickness variation of a multiple-surface object by a wavelength tuning interferometer", Proc. SPIE 6024, ICO20: Optical Devices and Instruments, 60240O (9 December 2005); https://doi.org/10.1117/12.666830
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KEYWORDS
Semiconducting wafers

Wafer-level optics

Wavelength tuning

Interferometers

Optical testing

Reflection

Interferometry

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