Paper
28 January 2006 Fabrication of 32×32 polymer arrayed waveguide gratings using remelting technique
Daming Zhang, Fei Wang, Xizhen Zhang, Wenyuan Deng, Shulin E
Author Affiliations +
Proceedings Volume 6025, ICO20: Optical Communication; 60251Q (2006) https://doi.org/10.1117/12.667075
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China
Abstract
A 32 × 32 arrayed waveguide grating (AWG) multiplexer operating around the 1550 nm wavelength has been designed and fabricated using fluorinated poly (ether ether ketone). The schematic layout is about 3.2×1.7 cm2. For our AWG, the total loss of designed AWG multiplexer is calculated to be 4.5 dB. We fabricated the AWG multiplexer by spin coating, photolithographic patterning and reactive ion etching (RIE). The core size is 5×5 μm2. The roughness of polymer surface was reduced by 20 nm using a remelting technique. The measured wavelength channel spacing of the fabricated AWG multiplexer is 0.796 nm and center wavelength is 1548 nm. The inserting loss of the AWG is 9.5 dB and crosstalk less than -20 dB.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daming Zhang, Fei Wang, Xizhen Zhang, Wenyuan Deng, and Shulin E "Fabrication of 32×32 polymer arrayed waveguide gratings using remelting technique", Proc. SPIE 6025, ICO20: Optical Communication, 60251Q (28 January 2006); https://doi.org/10.1117/12.667075
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KEYWORDS
Waveguides

Multiplexers

Polymers

Reactive ion etching

Optical lithography

Refractive index

Aluminum

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