Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering

Junqi Xu; Lingxia Hang; Weiguo Liu; Huiqing Fan; Yingxue Xing

doi:10.1117/12.674295

9 June 2006 Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering

Junqi Xu, Lingxia Hang, Weiguo Liu, Huiqing Fan, Yingxue Xing

Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61492S (2006) https://doi.org/10.1117/12.674295
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China

Abstract

Hydrogen-free carbon films were deposited and synthesized by unbalanced magnetron sputtering (UBMS) using a graphite target in Ar atmosphere. The ion beam flow density was measured by a Langmuir probe under the condition of deposition DLC films. The results indicated that this unbalanced magnetron sputtering system can obtain ion beam density as high as 2.0 mAcm^-2 even at low pressure of 0.5 Pa with an excitation current of 120 A, far larger than 0.3 mAcm^-2 in a conventional balanced magnetron sputtering (MS) system. Hydrogen-free carbon films were deposited by PVD method with a rectangle graphite target of 480×120 mm. The Raman spectrum of carbon film was presented. It was proved that the film's structure is a typical diamond-like carbon. The Raman intensity of diamond and graphite peak I_D/I_Gis as high as 2.26. Surface morphology was investigated by using an Atomic Force Microscope (AFM). The image indicated that the surface of carbon films is smooth; with the grains size about 10 nm and the surface roughness Rα about 2.5 nm, respectively. IR spectrum presented high optical transparency of 61.4% coated on single side of Ge sample, and no obvious absorption peaks were founded between 5000 and 1000 cm^-1 owe to lack of hydrogen.

Citation Download Citation

Junqi Xu, Lingxia Hang, Weiguo Liu, Huiqing Fan, and Yingxue Xing "Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61492S (9 June 2006); https://doi.org/10.1117/12.674295

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KEYWORDS

Carbon

Sputter deposition

Ion beams

Raman spectroscopy

Protactinium

Argon

Germanium

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