Higher current density operation with EB reticle writer EBM-5000

Masato Saito; Kunihiro Ugajin; Tomotaka Higaki; Hideaki Nishino; Hidehiro Watanabe

doi:10.1117/12.681747

20 May 2006 Higher current density operation with EB reticle writer EBM-5000

Masato Saito, Kunihiro Ugajin, Tomotaka Higaki, Hideaki Nishino, Hidehiro Watanabe

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62831L (2006) https://doi.org/10.1117/12.681747
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

The performance of electron beam reticle writer EBM-5000(NFT) was examined with higher current density. The current density was raised up to 70A/cm² against to its standard current density 50A/cm², and sufficiently good results were obtained with that operating condition. We concluded that the performance with that operating condition was good enough to produce photomasks for 65nm node devices.

Citation Download Citation

Masato Saito, Kunihiro Ugajin, Tomotaka Higaki, Hideaki Nishino, and Hidehiro Watanabe "Higher current density operation with EB reticle writer EBM-5000", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62831L (20 May 2006); https://doi.org/10.1117/12.681747

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