Paper
12 February 2007 Development of amorphous SiC for MEMS-based microbridges
James B. Summers, Maximilian Scardelletti, Rocco Parro, Christian A. Zorman
Author Affiliations +
Abstract
This paper reports our effort to develop amorphous hydrogenated silicon carbide (a-SiC:H) films specifically designed for MEMS-based microbridges using methane and silane as the precursor gases. In our work, the a-SiC:H films were deposited in a simple, commercial PECVD system at a fixed temperature of 300°C. Films with thicknesses from 100 nm to 1000 nm, a typical range for many MEMS applications, were deposited. Deposition parameters such as deposition pressure and methane-to-silane ratio were varied in order to obtain films with suitable residual stresses. Average residual stress in the as-deposited films selected for device fabrication was found by wafer curvature measurements to be -658 ± 22 MPa, which could be converted to 177 ± 40 MPa after thermal annealing at 450°C, making them suitable for micromachined bridges, membranes and other anchored structures. Bulk micromachined membranes were constructed to determine the Young's modulus of the annealed films, which was found to be 205 ± 6 GPa. Chemical inertness was tested in aggressive solutions such as KOH and HF. Prototype microbridge actuators were fabricated using a simple surface micromachining process to assess the potential of the a-SiC:H films as structural layers for MEMS applications.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James B. Summers, Maximilian Scardelletti, Rocco Parro, and Christian A. Zorman "Development of amorphous SiC for MEMS-based microbridges", Proc. SPIE 6464, MEMS/MOEMS Components and Their Applications IV, 64640H (12 February 2007); https://doi.org/10.1117/12.704705
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Cited by 4 scholarly publications.
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KEYWORDS
Silicon carbide

Etching

Semiconducting wafers

Silicon

Actuators

Plasma enhanced chemical vapor deposition

Electrodes

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