Characterization of light scattering and film structure of TiO2 thin film

H. Murotani; T. Kudo; M. Wakaki

doi:10.1117/12.699471

20 February 2007 Characterization of light scattering and film structure of TiO₂ thin film

H. Murotani, T. Kudo, M. Wakaki

Proceedings Volume 6469, Optical Components and Materials IV; 646910 (2007) https://doi.org/10.1117/12.699471
Event: Integrated Optoelectronic Devices 2007, 2007, San Jose, California, United States

Abstract

The structure of optical thin films changes depending on various parameters. Typical these parameters are materials, coating methods and coating parameters (for example, assisted ion beam power etc.). For example, titanium dioxide thin films prepared by IAD (Ion Assisted Deposition) method take the column structure. Foggy levels of the deposited film depend on the film structure. Recently, the foggy levels are measured using a haze meter. But weak foggy sample with small haze value does not correspond to visual inspection. In this work, optical thin films were characterized by not only the intensity of the scattered light but also wavelength parameter. As a result, it was found that the estimation of the structure of optical thin films was possible by using the wavelength dependence of the scattered light.

Citation Download Citation

H. Murotani, T. Kudo, and M. Wakaki "Characterization of light scattering and film structure of TiO₂ thin film", Proc. SPIE 6469, Optical Components and Materials IV, 646910 (20 February 2007); https://doi.org/10.1117/12.699471

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