Surface microstructures of silica glass by laser-induced backside wet etching

H. Niino; Y. Kawaguchi; T. Sato; A. Narazaki; R. Kurosaki

doi:10.1117/12.762240

14 February 2008 Surface microstructures of silica glass by laser-induced backside wet etching

H. Niino, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki

Proceedings Volume 6879, Photon Processing in Microelectronics and Photonics VII; 68790C (2008) https://doi.org/10.1117/12.762240
Event: Lasers and Applications in Science and Engineering, 2008, San Jose, California, United States

Abstract

We have investigated a one-step method to fabricate a microstructure on a silica glass plate using laser-induced backside wet etching (LIBWE) upon irradiation with DPSS (diode-pumped solid state) lasers. Well-defined deep microtrenches without crack formations on a fused silica glass plate were fabricated by LIBWE method. As the laser beam of DPSS UV laser at a high repetition rate up to 5 - 100 kHz is scanned on the sample surface with the galvanometer controlled by a computer for flexible operations, galvanometer-based point scanning system is suitable for a rapid prototyping process according to electronic design data in the computer. The behavior of liquid ablation (explosive vaporization) was monitored by impulse pressure detection with a fast-response piezoelectric pressure gauge. LIBWE method is suitable for rapid prototyping and rapid manufacturing of surface microstructuing of silica glass as mask-less exposure system in a conventional atmospheric environment.

Citation Download Citation

H. Niino, Y. Kawaguchi, T. Sato, A. Narazaki, and R. Kurosaki "Surface microstructures of silica glass by laser-induced backside wet etching", Proc. SPIE 6879, Photon Processing in Microelectronics and Photonics VII, 68790C (14 February 2008); https://doi.org/10.1117/12.762240

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