Nanoscale growth control of functional thin films on atomically surface-controlled substrates by laser MBE

Wakana Hara; Mamoru Yoshimoto

doi:10.1117/12.773283

14 February 2008 Nanoscale growth control of functional thin films on atomically surface-controlled substrates by laser MBE

Wakana Hara, Mamoru Yoshimoto

Author Affiliations +

Proceedings Volume 6879, Photon Processing in Microelectronics and Photonics VII; 68790V (2008) https://doi.org/10.1117/12.773283
Event: Lasers and Applications in Science and Engineering, 2008, San Jose, California, United States

Abstract

The nanoscale growth control of functional ceramic thin films was examined by our originally developed technique, which was based on the nanoscale substrate engineering as well as atomic layer control via laser molecular beam epitaxy (laser-MBE). The atomically controlled surface of the substrate such as the ultrasmooth sapphire (single-crystal Al₂O₃) substrate with atomic steps and atomically smooth terraces was found to enhance atomically layer-by-layer growth as well as self-assembled nucleation along the atomic steps. The novel epitaxial growths could be attained on the physically or chemically controlled substrates, that is, (1) termination-regulated molecular layer-by-layer epitaxy, (2) step-decoration epitaxy resulting in the nanowire or nanodots, (3) room-temperature epitaxial growth of AlN, and (4) self-organized formation of the nanogroove-striped pattern on the film surface.

Citation Download Citation

Wakana Hara and Mamoru Yoshimoto "Nanoscale growth control of functional thin films on atomically surface-controlled substrates by laser MBE", Proc. SPIE 6879, Photon Processing in Microelectronics and Photonics VII, 68790V (14 February 2008); https://doi.org/10.1117/12.773283

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