Paper
11 February 2008 Length dependence of in-plane polarizations anisotropy in GaInAsP/InP quantum-wire structures fabricated by dry etching and regrowth process
D. Plumwongrot, Y. Tamura, Y. Nishimoto, M. Kurokawa, T. Okumura, T. Maruyama, N. Nishiyama, S. Arai
Author Affiliations +
Abstract
Wire-length dependences of In-place polarization anisotropy in GaInAsP/InP quantum-wire (Q-wire) structures fabricated by dry-etching and regrowth processes were investigated using a photo luminescence (PL) measurement. The reduction of polarization anisotropy of Q-wires is expected in the shorter Q-Wires. A strain-compensated GaInAsP/InP single-quantum-well initial wafer was prepared by an organometallic-vapor-phase-epitaxy (OMVPE) system. Using electron beam lithography, Ti-mask lift-off, CH4/H2 reactive-ion-etching and OMVPE regrowth processes, various lengths (L) of the Q-wires were realized for wire-widths (W) of 11-, 14- and 18 nm. The Q-wires were measured the polarization property in normal and parallel to wire-length direction at room temperature. As a result, stronger polarization anisotropy was observed in narrower Q-Wires and reduced in shorter length of Q-Wires. Furthermore, polarization anisotropy of strained Q-Wires was predicted by taking in account of the dipole moment interaction between conduction and heavy-hole subbands optical transition. A 5-nm narrowed wire-width calculation results shows a good agreement with experimental results. This could be considered that a strain distribution in the Q-Wire induced the energy band deformation at the edge of the Q-Wire, which reduced the effective wire-width to much narrower than the actual size observed by an SEM image.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Plumwongrot, Y. Tamura, Y. Nishimoto, M. Kurokawa, T. Okumura, T. Maruyama, N. Nishiyama, and S. Arai "Length dependence of in-plane polarizations anisotropy in GaInAsP/InP quantum-wire structures fabricated by dry etching and regrowth process", Proc. SPIE 6902, Quantum Dots, Particles, and Nanoclusters V, 690205 (11 February 2008); https://doi.org/10.1117/12.762201
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Cited by 2 scholarly publications.
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KEYWORDS
Polarization

Anisotropy

Polymethylmethacrylate

Scanning electron microscopy

Quantum wells

Dry etching

Semiconducting wafers

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