Metal fluoride coatings prepared by ion-assisted deposition

Martin Bischoff; Maik Sode; Dieter Gäbler; Helmut Bernitzki; Christoph Zaczek; Norbert Kaiser; Andreas Tünnermann

doi:10.1117/12.797422

25 September 2008 Metal fluoride coatings prepared by ion-assisted deposition

Martin Bischoff, Maik Sode, Dieter Gäbler, Helmut Bernitzki, Christoph Zaczek, Norbert Kaiser, Andreas Tünnermann

Proceedings Volume 7101, Advances in Optical Thin Films III; 71010L (2008) https://doi.org/10.1117/12.797422
Event: Optical Systems Design, 2008, Glasgow, Scotland, United Kingdom

Abstract

ArF lithography technology requires minimization of optical losses due to scattering and absorption. Consequently, it is necessary to optimize the coating process of metal fluorides. The properties of metal fluoride thin films are mainly affected by the deposition methods, their parameters (temperature and deposition rate) and the vacuum conditions. A substrate temperature of more than 300°C is a condition for high density and low water content of metal fluorides. Therefore, a substrate temperature of 150°C results in inhomogeneous films with high water content. Until now, the best results were achieved by boat evaporation. This paper will demonstrate that most of the common metal fluorides like MgF₂, AlF₃, and even LaF₃ can be deposited by electron beam evaporation. In comparison to other deposition methods, the prepared thin films have the lowest absorption in the VUV spectral range. Furthermore, metal fluoride thin films were prepared by ion assistance. It will be demonstrated, that they have less water content, high packing density, and low absorption in the VUV spectral range. In this study, single layers of LaF₃ and AlF₃ and antireflection coatings were prepared by electron beam evaporation with and without ion-assistance. The mechanical, structural, and optical properties were examined and discussed.

Citation Download Citation

Martin Bischoff, Maik Sode, Dieter Gäbler, Helmut Bernitzki, Christoph Zaczek, Norbert Kaiser, and Andreas Tünnermann "Metal fluoride coatings prepared by ion-assisted deposition", Proc. SPIE 7101, Advances in Optical Thin Films III, 71010L (25 September 2008); https://doi.org/10.1117/12.797422

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