Identifying resonance frequency deviations for high order nano-wire ring resonator filters based on a coupling strength variation

Sahnggi Park; Kap-Joong Kim; Duk-Jun Kim; Gyungock Kim

doi:10.1117/12.808868

17 February 2009 Identifying resonance frequency deviations for high order nano-wire ring resonator filters based on a coupling strength variation

Sahnggi Park, Kap-Joong Kim, Duk-Jun Kim, Gyungock Kim

Author Affiliations +

Proceedings Volume 7220, Silicon Photonics IV; 72200Y (2009) https://doi.org/10.1117/12.808868
Event: SPIE OPTO: Integrated Optoelectronic Devices, 2009, San Jose, California, United States

Abstract

Third order ring resonators are designed and their resonance frequency deviations are analyzed experimentally by processing them with E-beam lithography and ICP etching in a CMOS nano-Fabrication laboratory. We developed a reliable method to identify and reduce experimentally the degree of deviation of each ring resonance frequency before completion of the fabrication process. The identified deviations can be minimized by the way to be presented in this paper. It is expected that this method will provide a significant clue to make a high order multi-channel ring resonators.

Citation Download Citation

Sahnggi Park, Kap-Joong Kim, Duk-Jun Kim, and Gyungock Kim "Identifying resonance frequency deviations for high order nano-wire ring resonator filters based on a coupling strength variation", Proc. SPIE 7220, Silicon Photonics IV, 72200Y (17 February 2009); https://doi.org/10.1117/12.808868

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