A novel fast 3D resist simulation method using Chebyshev expansion

Masanori Takahashi; Satoshi Tanaka; Shoji Mimotogi; Soichi Inoue

doi:10.1117/12.813606

16 March 2009 A novel fast 3D resist simulation method using Chebyshev expansion

Masanori Takahashi, Satoshi Tanaka, Shoji Mimotogi, Soichi Inoue

Proceedings Volume 7274, Optical Microlithography XXII; 727432 (2009) https://doi.org/10.1117/12.813606
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

A new simulation method with Chebyshev expansion is proposed to calculate three-dimensional resist profiles in a short time using Fast Cosine Transform (FCT) algorithm. This method can be applied to the solution of the full 3D model for OPC and LCC, and it is valid to evaluate the cross-sectional resist shape under the condition where the influence of reflection wave from the underlayer is significant. We show the results of evaluation with regard to accuracy and precision, expanding three-dimensional profiles using Chebyshev expansion. In addition, we report the comparison with numerical experiments.

Citation Download Citation

Masanori Takahashi, Satoshi Tanaka, Shoji Mimotogi, and Soichi Inoue "A novel fast 3D resist simulation method using Chebyshev expansion", Proc. SPIE 7274, Optical Microlithography XXII, 727432 (16 March 2009); https://doi.org/10.1117/12.813606

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