Refractive index engineering by fast ion implantations: a generic method for constructing multi-components electro-optical circuits

Aharon J. Agranat; Alexander Gumennik; Harel Ilan

doi:10.1117/12.841287

11 February 2010 Refractive index engineering by fast ion implantations: a generic method for constructing multi-components electro-optical circuits

Aharon J. Agranat, Alexander Gumennik, Harel Ilan

Author Affiliations +

Proceedings Volume 7604, Integrated Optics: Devices, Materials, and Technologies XIV; 76040Y (2010) https://doi.org/10.1117/12.841287
Event: SPIE OPTO, 2010, San Francisco, California, United States

Abstract

Refractive index engineering (RI_Eng) by ion implantations is a generic methodology for constructing multi-component integrated circuits of electrooptic and nanophotonic devices with sub-wavelength features operating in the visible - near IR wavelengths. The essence of the method is to perform spatially selective implantations for sculpting complex 3D pre-designed amorphized patterns with sub-wavelength features and reduced refractive index within the volume of the substrate. A number of devices that were constructed in a substrate of potassium lithium tantalate niobate are described, including a submerged slab waveguide, an optical wire and a channel waveguide array.

Citation Download Citation

Aharon J. Agranat, Alexander Gumennik, and Harel Ilan "Refractive index engineering by fast ion implantations: a generic method for constructing multi-components electro-optical circuits", Proc. SPIE 7604, Integrated Optics: Devices, Materials, and Technologies XIV, 76040Y (11 February 2010); https://doi.org/10.1117/12.841287

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