Theoretical analysis of energy dissipation of electron in the resists II

Minoru Toriumi

doi:10.1117/12.846503

30 March 2010 Theoretical analysis of energy dissipation of electron in the resists II

Minoru Toriumi

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76392N (2010) https://doi.org/10.1117/12.846503
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In the electron-beam lithography and extreme-ultraviolet lithography, electrons above ionization energy collide with resist materials and bring out the ionization and electronic excitations of resist molecules. The energy degradation mechanism of the incident primary electrons in resists plays the important role to determine the resist properties. The Monte Carlo simulation using the binary-encounter-collision cross section was performed to determine the electron trajectory in resist materials. The distributions of product species had an edge around 500 eV of incident energy of primary electron. The product distributions of ions and singlets became the narrower in electronic excited states with decrease in incident energy and with increase of the electron generations. Main product of triplets was in the lowest excited state. Triplets had the longer scattering length than singlets and ions.

Citation Download Citation

Minoru Toriumi "Theoretical analysis of energy dissipation of electron in the resists II", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76392N (30 March 2010); https://doi.org/10.1117/12.846503

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