Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

Hirotaka Kohno; Yuichi Shibazaki; Jun Ishikawa; Junichi Kosugi; Yasuhiro Iriuchijima; Masato Hamatani

doi:10.1117/12.846485

10 March 2010 Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

Hirotaka Kohno, Yuichi Shibazaki, Jun Ishikawa, Junichi Kosugi, Yasuhiro Iriuchijima, Masato Hamatani

Author Affiliations +

Proceedings Volume 7640, Optical Microlithography XXIII; 76401O (2010) https://doi.org/10.1117/12.846485
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Currently, it is considered that one of the most favorable options for the 32 nm HP node is pitch-splitting double patterning, which requires the lithography tool to achieve high productivity and high overlay accuracy simultaneously. In the previous work ^[1], we described the concepts and the technical features of Nikon's immersion scanner based on our newly developed platform, Streamlign, designed for 2nm overlay, 200wph throughput, and short setup time. In this paper, we present the latest actual performance of S620D with the Streamlign platform. Owing to the high repeatability of our new encoder metrology system, Bird's Eye Control, and Stream Alignment, S620D achieves less than 2 nm overlay accuracy, less than 15nm focus accuracy, and successful 32 and 22 nm L/S pitchsplitting double patterning exposures. Furthermore, the results at high scanning speed up to 700 mm/s are fine and we have successfully demonstrated over 4,000 wpd throughput, which confirms the potential for high productivity. Nikon has developed this Streamlign as an optimized long life platform based on the upgradable Modular² structure for upcoming generations. The performance of S620D indicates the possibility of immersion extension down through the 22 nm HP node and beyond.

Citation Download Citation

Hirotaka Kohno, Yuichi Shibazaki, Jun Ishikawa, Junichi Kosugi, Yasuhiro Iriuchijima, and Masato Hamatani "Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation", Proc. SPIE 7640, Optical Microlithography XXIII, 76401O (10 March 2010); https://doi.org/10.1117/12.846485

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