Paper
18 May 2010 Design and fabrication of photonic crystal thin film photovoltaic cells
Guillaume Gomard, Ounsi El Daif, Emmanuel Drouard, Xianqin Meng, Anne Kaminski, Alain Fave, Mustapha Lemiti, Enric Garcia-Caurel, Pere Roca i Cabarrocas, Christian Seassal
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Abstract
We present the integration of an absorbing planar photonic crystal within a thin film photovoltaic cell. The devices are based on a stack including a hydrogenated amorphous silicon P-i-N junction surrounded by TCO layers, with a back metallic contact. Optical simulations exhibit a significant increase of the integrated absorption in the 300-720nm wavelength range. The global electro-optical characteristics of such a new solar cell, and the impact of surface passivation, are also discussed. Carrier generation rate maps calculated by optical simulations are introduced as input data in a commercial electrical simulation software. The fabrication of such a device is finally addressed, with a specific focus on the use of low cost nanopatterning processes compatible with large areas.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guillaume Gomard, Ounsi El Daif, Emmanuel Drouard, Xianqin Meng, Anne Kaminski, Alain Fave, Mustapha Lemiti, Enric Garcia-Caurel, Pere Roca i Cabarrocas, and Christian Seassal "Design and fabrication of photonic crystal thin film photovoltaic cells", Proc. SPIE 7725, Photonics for Solar Energy Systems III, 77250M (18 May 2010); https://doi.org/10.1117/12.854383
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Cited by 2 scholarly publications.
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KEYWORDS
Absorption

Solar cells

Photonic crystals

Silver

Thin film solar cells

Thin films

Zinc oxide

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