Extraction and utilization of the repeating patterns for CP writing in mask making

Masahiro Shoji; Tadao Inoue; Masaki Yamabe

doi:10.1117/12.864285

25 May 2010 Extraction and utilization of the repeating patterns for CP writing in mask making

Masahiro Shoji, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77480Y (2010) https://doi.org/10.1117/12.864285
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan

Abstract

In May 2006, the Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) at the Association of Super-Advanced Electronics Technologies (ASET) launched a 4-year program for reducing mask manufacturing cost and TAT by concurrent optimization of Mask Data Preparation (MDP), mask writing, and mask inspection [1]. Figure 1 shows an outline of the project at Mask D2I at ASET. As one of the tasks being pursued at the Mask Design Data Technology Research Laboratory we have evaluated the effect of reducing the writing shot counts by utilizing the repeating patterns, and that showed positive impact on mask making by using CP writing. During the past four years, we have developed a software to extract repeating patterns from fractured OPCed mask data and have evaluated the efficiency of reducing the writing shot counts using the repeating patterns with this software. In this evaluation, we have used many actual device production data obtained from the member companies of Mask D2I. To the extraction software, we added new functions for extracting common repeating patterns from a set of multiple masks, and studied how this step affects the ratio of reducing the shot counts in comparison to the case of utilization of the repeating patterns for single mask. We have also developed a software that uses the result of extracting repeating patterns and prepares writing-data for the MCC/CP writing system which has been developed at the Mask Writing Equipment Technology Research Laboratory. With this software, we have examined how EB proximity effect on CP writing affects in reducing the shot count where CP shots with large CD errors have to be divided into VSB shots. In this paper we will report on making common CP mask from a set of multiple actual device data by using these software, and will also report on the results of CP writing and calculation of writing-TAT by MCC/CP writing system.

Citation Download Citation

Masahiro Shoji, Tadao Inoue, and Masaki Yamabe "Extraction and utilization of the repeating patterns for CP writing in mask making", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77480Y (25 May 2010); https://doi.org/10.1117/12.864285

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