Study of 18.2-nm Schwarzschild microscope for plasma diagnostics

Xin Wang; Baozhong Mu; Yi Huang; Zirong Zhai; Shengzhen Yi; Li Jiang; Jingtao Zhu; Zhanshan Wang; Hongjie Liu; Leifeng Cao; Yuqiu Gu

doi:10.1117/12.860281

25 August 2010 Study of 18.2-nm Schwarzschild microscope for plasma diagnostics

Xin Wang, Baozhong Mu, Yi Huang, Zirong Zhai, Shengzhen Yi, Li Jiang, Jingtao Zhu, Zhanshan Wang, Hongjie Liu, Leifeng Cao, Yuqiu Gu

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Proceedings Volume 7801, Advances in Metrology for X-Ray and EUV Optics III; 78010G (2010) https://doi.org/10.1117/12.860281
Event: SPIE Optical Engineering + Applications, 2010, San Diego, California, United States

Abstract

A Schwarzschild microscope at 18.2 nm for ultra-fast laser plasma diagnostics has been developed. Based on the third-order aberration the microscope is designed for numerical aperture of 0.1 and magnification of 10. Spatial resolution of the objective can achieve 1250 lp/mm within the field of ±1 mm. Mo/Si multilayer films with peak throughout at 18.2 nm is designed and deposited by magnetron sputtering, and the measured reflectivity of optical elements is 45%. The 600 lp/inch copper grid backlit by laser produced plasma is imaging via Schwarzschild microscope on CCD. The spatial resolution is measured as 3 μm approximately in the field of 1.2 mm.

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Xin Wang, Baozhong Mu, Yi Huang, Zirong Zhai, Shengzhen Yi, Li Jiang, Jingtao Zhu, Zhanshan Wang, Hongjie Liu, Leifeng Cao, and Yuqiu Gu "Study of 18.2-nm Schwarzschild microscope for plasma diagnostics", Proc. SPIE 7801, Advances in Metrology for X-Ray and EUV Optics III, 78010G (25 August 2010); https://doi.org/10.1117/12.860281

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KEYWORDS

Microscopes

Mirrors

Spatial resolution

Plasma diagnostics

Reflectivity

Multilayers

Objectives

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