Effects of electric field distribution and pulse duration on the ultra-short pulse laser damage resistance of laser coatings

Shunli Chen; Meiping Zhu; Dawei Li; Hongbo He; Yuanan Zhao; Jianda Shao; Zhengxiu Fan

doi:10.1117/12.867225

29 November 2010 Effects of electric field distribution and pulse duration on the ultra-short pulse laser damage resistance of laser coatings

Shunli Chen, Meiping Zhu, Dawei Li, Hongbo He, Yuanan Zhao, Jianda Shao, Zhengxiu Fan

Author Affiliations +

Proceedings Volume 7842, Laser-Induced Damage in Optical Materials: 2010; 78420D (2010) https://doi.org/10.1117/12.867225
Event: Laser Damage Symposium XLII: Annual Symposium on Optical Materials for High Power Lasers, 2010, Boulder, Colorado, United States

Abstract

Two kinds of multilayer HfO₂/SiO₂ high reflectors, the "standard" and "modified" designs with different electric field distribution, were investigated in this paper. A femtosecond laser system was applied to test the laser-induced damage thresholds (LIDTs) of these two kinds of coatings. Optical microscopy and scanning electron microscopy (SEM) were employed to study the morphology and structural information of the damage site. Compared the LIDTs of "modified" design with that of "standard" design, it was found that reducing electric field at layer interface could improve the LIDTs of multilayer coatings. Furthermore, the improvement efficiency showed certain dependency on the pulse width. Diverse roles of several conceivable ionization mechanisms played in the damage process were discussed to explain the relation between the LIDTs and electric field distribution.

Citation Download Citation

Shunli Chen, Meiping Zhu, Dawei Li, Hongbo He, Yuanan Zhao, Jianda Shao, and Zhengxiu Fan "Effects of electric field distribution and pulse duration on the ultra-short pulse laser damage resistance of laser coatings", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420D (29 November 2010); https://doi.org/10.1117/12.867225

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