Paper
21 February 2011 F2 laser formation of SiO2 protective layer onto polycarbonate for lightweight vehicle window
Shingo Sonobe, Yoshihiko Nojima, Masayuki Okoshi, Hidetoshi Nojiri, Narumi Inoue
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Abstract
Silicone-coated polycarbonate (PC) through an acrylic primer was photochemically modified into silica (SiO2) by 157 nm F2 laser. The photomodified surface showed high scratch resistance comparable to the case in a bulk silica. Corresponding to the conversion of silicone into silica on PC, the photomodified surface was found to be shrunk, measured by a surface profilometer. For instance, the coated silicone on PC reduced the thickness of approximately 15 % when the F2 laser modified silicone into silica 0.59 μin thickness. An excess irradiation of F2 laser for the photochemical modification induced the degradation of acrylic primer underneath silicone.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shingo Sonobe, Yoshihiko Nojima, Masayuki Okoshi, Hidetoshi Nojiri, and Narumi Inoue "F2 laser formation of SiO2 protective layer onto polycarbonate for lightweight vehicle window", Proc. SPIE 7920, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVI, 79201A (21 February 2011); https://doi.org/10.1117/12.878450
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KEYWORDS
Silicon

Semiconductor lasers

Silica

Laser irradiation

Thin film coatings

Resistance

Glasses

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