Highly efficient diffractive beam splitters surface-structured on submicron scale using deep-UV laser interference lithography

Jun Amako; Daisuke Sawaki; Eiichi Fujii

doi:10.1117/12.871859

21 February 2011 Highly efficient diffractive beam splitters surface-structured on submicron scale using deep-UV laser interference lithography

Jun Amako, Daisuke Sawaki, Eiichi Fujii

Author Affiliations +

Proceedings Volume 7921, Laser-based Micro- and Nanopackaging and Assembly V; 79210N (2011) https://doi.org/10.1117/12.871859
Event: SPIE LASE, 2011, San Francisco, California, United States

Abstract

Highly efficient diffractive beam splitters surface-structured on submicron scale are presented. Submicron relief structures formed on the surfaces of a splitter work as an anti-reflective layer to improve the beam-splitting efficiency. Surface structuring is conducted using deep-UV, liquid-immersion interference lithography and dry etching. Rigorously designed structures with a period of 140 nm and a depth of 55 nm are lithographed onto fused-silica splitters. Splitting efficiencies at 266 nm are increased by 8% to agree favorably with a theoretical value, while Fresnel reflections are substantially reduced. Surface-structured beam splitters reported here are of great use in industrial machining applications using high-power pulsed lasers.

Citation Download Citation

Jun Amako, Daisuke Sawaki, and Eiichi Fujii "Highly efficient diffractive beam splitters surface-structured on submicron scale using deep-UV laser interference lithography", Proc. SPIE 7921, Laser-based Micro- and Nanopackaging and Assembly V, 79210N (21 February 2011); https://doi.org/10.1117/12.871859

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