A method of calculating reflectance distributions for CGH with FDTD using the structure of actual surfaces

Tsubasa Ichikawa; Yuji Sakamoto; Agus Subagyo; Kazuhisa Sueoka

doi:10.1117/12.874481

7 February 2011 A method of calculating reflectance distributions for CGH with FDTD using the structure of actual surfaces

Tsubasa Ichikawa, Yuji Sakamoto, Agus Subagyo, Kazuhisa Sueoka

Author Affiliations +

Proceedings Volume 7957, Practical Holography XXV: Materials and Applications; 795707 (2011) https://doi.org/10.1117/12.874481
Event: SPIE OPTO, 2011, San Francisco, California, United States

Abstract

Computer Generated Hologram (CGH) is generated by computer simulation using the diffraction theory. However, the development of a rendering technology to display images beautifully like in the field of Computer Graphics is scarce. The research for reflectance distribution is particularly so few, that the texture of each material cannot be expressed. Therefore we propose a calculation method for calculating reflectance distribution for CGH that uses the finite-difference time-domain (FDTD) method. In this method, reflected light from an uneven surface made in the computer is analyzed by FDTD simulation, and a reflected light distribution is applied to CGH as object light. To make the outer structure identical to the real objects, the outer structure of the real objects was measured with an atomic force microscope (AFM). By using the measurement data, peculiar reflectance distributions of the materials are given for CGH. It was confirmed that the variation of the surface roughness of the measured sample affected the three-dimensional images in optical reconstruction. Moreover, we report the relation between the surface roughness of samples and the reflectance distribution.

Citation Download Citation

Tsubasa Ichikawa, Yuji Sakamoto, Agus Subagyo, and Kazuhisa Sueoka "A method of calculating reflectance distributions for CGH with FDTD using the structure of actual surfaces", Proc. SPIE 7957, Practical Holography XXV: Materials and Applications, 795707 (7 February 2011); https://doi.org/10.1117/12.874481

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