Use of scatterometry for scanner matching

Holger Bald; Rolf Seltmann; Karsten Bubke; Matthias Ruhm; Marc Noot; Dieter Woischke; Paul van Adrichem; Paul Luehrmann

doi:10.1117/12.886120

1 April 2011 Use of scatterometry for scanner matching

Holger Bald, Rolf Seltmann, Karsten Bubke, Matthias Ruhm, Marc Noot, Dieter Woischke, Paul van Adrichem, Paul Luehrmann

Proceedings Volume 7985, 27th European Mask and Lithography Conference; 79850J (2011) https://doi.org/10.1117/12.886120
Event: 27th European Mask and Lithography Conference, 2011, Dresden, Germany

Abstract

For the high volume manufacturing at the 45nm node and beyond it is crucial to match the OPC behaviour of all scanners used at a given process step. For this task the ASML LithoTuner PatternMatcher software was used. LithoTuner PatternMatcher is a tool to improve the proximity differences between a reference scanner and one or more so called 'to be matched' scanners. The optimization uses the concept of sensitivities of CDs of critical features towards adjustable scanner parameters in combination with the delta CD's of those critical features. To perform the scanner matching it is very important to have accurate and repeatable CD data. Therefore we investigated the use of scatterometry as a replacement for the traditional CDSEM measurement. Scatterometry significantly enhances the measurement precision while simultaneously reduces the measurement time. In a first step we determined the sensitivities of the structures by measuring the CD response to small perturbations of the individual scanner parameter settings. CD through pitch and repeating 2 dimensional line end structures were measured using the ASML YieldStar tool and a Hitachi CDSEM. The scatterometry- and CDSEM based sensitivities of the scanner parameter settings are compared. Finally a scanner matching based on both sets of sensitivities has been performed. In this article we will show that both methods are suited to perform the scanner matching. We will also present the differences between the two sets of sensitivities obtained with scatterometry and CDSEM. At the end we will present the results of the tool matching and show the results of a cross check. In the cross check sensitivities obtained with the use of scatterometry were used for the scanner matching next to SEM metrology used for verification.

Citation Download Citation

Holger Bald, Rolf Seltmann, Karsten Bubke, Matthias Ruhm, Marc Noot, Dieter Woischke, Paul van Adrichem, and Paul Luehrmann "Use of scatterometry for scanner matching", Proc. SPIE 7985, 27th European Mask and Lithography Conference, 79850J (1 April 2011); https://doi.org/10.1117/12.886120

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KEYWORDS

Scanners

Scatterometry

Scanning electron microscopy

Semiconducting wafers

Optical proximity correction

Time metrology

Metrology

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