Damage formation and characterization with scanning photoemission spectromicroscopy

L. Gregoratti; M. Amati; M. K. Abyaneh

doi:10.1117/12.887834

18 May 2011 Damage formation and characterization with scanning photoemission spectromicroscopy

L. Gregoratti, M. Amati, M. K. Abyaneh

Proceedings Volume 8077, Damage to VUV, EUV, and X-ray Optics III; 80770K (2011) https://doi.org/10.1117/12.887834
Event: SPIE Optics + Optoelectronics, 2011, Prague, Czech Republic

Abstract

Scanning photoemission spectromicroscopy is a powerful tool for the chemical characterization of materials based on third generation synchrotron light sources. Due to the X-ray focalization properties it represents also an extremely bright source of radiation ideal for the investigation of radiation effects on matter. Despite the experiments involving inorganic materials, such as oxides, lead in the last decade have already shed light on the potentials of this techniques to perform lateral resolved chemical analysis, still there is a lack of information concerning the possibilities to measure organic compounds. This paper reports on the investigation of inorganic (Rh oxide thin films) and organic (polymers) samples performed with the scanning photoemission microscope hosted at the Elettra Synchrotron Light Laboratory. Results show that the typical photon densities in the focused spot of the microscope allow the investigation of the oxide films but produce an immediate damaging of the polymeric film.

Citation Download Citation

L. Gregoratti, M. Amati, and M. K. Abyaneh "Damage formation and characterization with scanning photoemission spectromicroscopy", Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 80770K (18 May 2011); https://doi.org/10.1117/12.887834

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