PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
Scanning photoemission spectromicroscopy is a powerful tool for the chemical characterization of materials based on
third generation synchrotron light sources. Due to the X-ray focalization properties it represents also an extremely bright
source of radiation ideal for the investigation of radiation effects on matter. Despite the experiments involving inorganic
materials, such as oxides, lead in the last decade have already shed light on the potentials of this techniques to perform
lateral resolved chemical analysis, still there is a lack of information concerning the possibilities to measure organic
compounds. This paper reports on the investigation of inorganic (Rh oxide thin films) and organic (polymers) samples
performed with the scanning photoemission microscope hosted at the Elettra Synchrotron Light Laboratory. Results
show that the typical photon densities in the focused spot of the microscope allow the investigation of the oxide films but
produce an immediate damaging of the polymeric film.
L. Gregoratti,M. Amati, andM. K. Abyaneh
"Damage formation and characterization with scanning photoemission spectromicroscopy", Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 80770K (18 May 2011); https://doi.org/10.1117/12.887834
ACCESS THE FULL ARTICLE
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
L. Gregoratti, M. Amati, M. K. Abyaneh, "Damage formation and characterization with scanning photoemission spectromicroscopy," Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 80770K (18 May 2011); https://doi.org/10.1117/12.887834