Paper
27 May 2011 Fringe pattern characterization by OPD analysis in a lateral shearing interferometric profilometer
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Abstract
A common-path interferometric profilometer using a Savart plate as a lateral shearer has been successfully tested under harsh environmental conditions to measure the shape of a surface, detecting defects and characterizing surface properties. The whole profile is obtained from a single image and its depth sensitivity is easily scalable, making this technique suitable for many different applications. Although this system has been successfully used for surface inspection and defect detection, some behaviors cannot be explained by the usual simple model for fringe formation, which, amongst other things, considers normal incidence of the incoming rays into the Savart plate. These deviations from the ideal case are more noticeable for high resolutions from short distances. This paper studies the formation of the fringe pattern, which is crucial for understanding the behavior of the system and proper calibration.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
María Frade, José María Enguita, Ignacio Álvarez, and Silvia Rodríguez-Jiménez "Fringe pattern characterization by OPD analysis in a lateral shearing interferometric profilometer", Proc. SPIE 8082, Optical Measurement Systems for Industrial Inspection VII, 80821S (27 May 2011); https://doi.org/10.1117/12.889267
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KEYWORDS
Fringe analysis

Wavefronts

Profilometers

Interferometry

Speckle

Charge-coupled devices

Crystals

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