Undulator emission analysis: comparison between measurements and simulations

Thierry Moreno; Edwige Otero; Xiaohao Dong; Philippe Ohresser

doi:10.1117/12.893778

23 September 2011 Undulator emission analysis: comparison between measurements and simulations

Thierry Moreno, Edwige Otero, Xiaohao Dong, Philippe Ohresser

Proceedings Volume 8141, Advances in Computational Methods for X-Ray Optics II; 81410H (2011) https://doi.org/10.1117/12.893778
Event: SPIE Optical Engineering + Applications, 2011, San Diego, California, United States

Abstract

The X-ray emission of the HU52 Apple2 undulator of the SOLEIL DEIMOS (Dichroism Experimental Installation for Magneto-Optical Spectroscopy) beamline is analyzed using the Bragg diffraction of a Si(111) crystal at various undulator gaps in linear horizontal polarization. Measurements are compared with simulations in order to determine undulator properties. The method allows also to get information on the electron beam.

Citation Download Citation

Thierry Moreno, Edwige Otero, Xiaohao Dong, and Philippe Ohresser "Undulator emission analysis: comparison between measurements and simulations", Proc. SPIE 8141, Advances in Computational Methods for X-Ray Optics II, 81410H (23 September 2011); https://doi.org/10.1117/12.893778

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available