Challenges associated with advanced mask cleaning

Brian J. Grenon

doi:10.1117/12.899055

13 October 2011 Challenges associated with advanced mask cleaning

Brian J. Grenon

Proceedings Volume 8166, Photomask Technology 2011; 81661K (2011) https://doi.org/10.1117/12.899055
Event: SPIE Photomask Technology, 2011, Monterey, California, United States

Abstract

Historically, photomask and wafer cleaning have been considered trivial tasks. The primary challenge had been simply the removal of particles that may have an impact on final product yield. As wavelengths decrease and energy on the image plane of the reticle increase, the degree and complexity of surface contaminants on the reticle become a more complicated challenge. The result is that the mask fabricator is faced with two new challenges; reducing and identifying the types of contaminants on the reticle prior to exposure in the wafer fab and eliminating contaminants that have been deposited in the fab. These contaminants are often different in that 193nm exposure produces higher molecular weight contaminants that can be more difficult to remove. While the effects of these contaminants may not be serious for transmissive lithography, their effects can be catastrophic for reflective lithography, such as Extreme Ultra- Violet (EUV) lithography. We will provide results showing the types of contaminants commonly found on various types of reticles and the respective challenges associated with their removal. Additionally, prior to developing an effective cleaning protocol understanding the chemical composition of the substrate is extremely important. We will provide analytical data that will clearly describe the composition of the mask substrates.

Citation Download Citation

Brian J. Grenon "Challenges associated with advanced mask cleaning", Proc. SPIE 8166, Photomask Technology 2011, 81661K (13 October 2011); https://doi.org/10.1117/12.899055

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available