Plasmonic enhancement of up-conversion in ultrathin layers

C. Andriamiadamanana; A. Ferrier; L. Lombez; A.-L. Joudrier; N. Naghavi; P. Ghenuche; N. Bardou; J.-L. Pelouard; S. Collin; F. Pelle; J.-F. Guillemoles

doi:10.1117/12.908541

21 February 2012 Plasmonic enhancement of up-conversion in ultrathin layers

C. Andriamiadamanana, A. Ferrier, L. Lombez, A.-L. Joudrier, N. Naghavi, P. Ghenuche, N. Bardou, J.-L. Pelouard, S. Collin, F. Pelle, J.-F. Guillemoles

Author Affiliations +

Proceedings Volume 8256, Physics, Simulation, and Photonic Engineering of Photovoltaic Devices; 825608 (2012) https://doi.org/10.1117/12.908541
Event: SPIE OPTO, 2012, San Francisco, California, United States

Abstract

Application of up-conversion in photovoltaic is limited by the up-conversion efficiency of materials. We propose to use a realistic plasmonic structure proposed in the literature to exceed this limitation. Erbium doped yttrium fluoride thin layer has been elaborated by ALD at 250°C to be used in such a structure as active up-converter material. Up-conversion properties of samples have been characterized using a confocal microscope. Samples, having a thickness below 100 nm, deposited onto a gold mirror, exhibit an up-conversion visible with naked eyes. The measurement of the enhancement factor of structures associated with the plasmonic resonnator has been performed by luminescence cartography. From these data, total enhancement factor up to 35 has been achieved by the use of the plasmonic structures, as compared to a layer deposited on a bare glass substrate.

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C. Andriamiadamanana, A. Ferrier, L. Lombez, A.-L. Joudrier, N. Naghavi, P. Ghenuche, N. Bardou, J.-L. Pelouard, S. Collin, F. Pelle, and J.-F. Guillemoles "Plasmonic enhancement of up-conversion in ultrathin layers", Proc. SPIE 8256, Physics, Simulation, and Photonic Engineering of Photovoltaic Devices, 825608 (21 February 2012); https://doi.org/10.1117/12.908541

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