Fabrication and characterization of Si/SiO2 high contrast grating using nanoimprint lithography

Yuuki Hashizume; Yasumitsu Miyake; Akihiro Matsutani; Hideo Ohtsuki; Fumio Koyama

doi:10.1117/12.910865

23 February 2012 Fabrication and characterization of Si/SiO₂ high contrast grating using nanoimprint lithography

Yuuki Hashizume, Yasumitsu Miyake, Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama

Proceedings Volume 8270, High Contrast Metastructures; 827008 (2012) https://doi.org/10.1117/12.910865
Event: SPIE OPTO, 2012, San Francisco, California, United States

Abstract

Nanoimprint lithography is a powerful tool for making large area sub-wavelength scale optical devices with high-throughput fabrication. We developed a thermal nanoimprint lithography process for making sub-wavelength HCG patterns on an SOI substrate. A vertical etching profile and a smooth etched surface, which meet the requirements for Si based HCG structure, were obtained. We fabricated large area (1cm x 1cm) HCG with good uniformity in the entire sample. The clear angular dependence of the reflectivity of Si-HCG can be seen, which is in good agreement with the modeling result. The engineered angular dependence of HCG could be useful for the mode control of VCSELs and spatial mode multiplexers.

Citation Download Citation

Yuuki Hashizume, Yasumitsu Miyake, Akihiro Matsutani, Hideo Ohtsuki, and Fumio Koyama "Fabrication and characterization of Si/SiO₂ high contrast grating using nanoimprint lithography", Proc. SPIE 8270, High Contrast Metastructures, 827008 (23 February 2012); https://doi.org/10.1117/12.910865

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